An Improved STEM/EDX Quantitative Method for Dopant Profiling at the Nanoscale.
Fiche publication
Date publication
janvier 2020
Journal
Microscopy and microanalysis : the official journal of Microscopy Society of America, Microbeam Analysis Society, Microscopical Society of Canada
Auteurs
Membres identifiés du Cancéropôle Est :
Dr MULLER Dominique
Tous les auteurs :
Makarem R, Cristiano F, Muller D, Fazzini PF
Lien Pubmed
Résumé
In this paper, an improved quantification technique for STEM/EDX measurements of 1D dopant profiles based on the Cliff-Lorimer equation is presented. The technique uses an iterative absorption correction procedure based on density models correlating the local mass density and composition of the specimen. Moreover, a calibration and error estimation procedure based on linear regression and error propagation is proposed in order to estimate the total measurement error in the dopant density. The proposed approach is applied to the measurement of the As profile in a nanodevice test structure. For the calibration, two crystalline Si specimens implanted with different As doses have been used, and the calibration of the Cliff-Lorimer coefficients has been carried out using Rutherford Back Scattering measurements. The As profile measurement has been carried out on an FinFET test structure, showing that quantitative results can be obtained in the nanometer scale and for dopant atomic densities lower than 1%. Using the proposed approach, the measurement error and detection limit for our experimental setup are calculated and the possibility to improve this limit by increasing the observation time is discussed.
Mots clés
EDX, STEM, dopant profiling, nanodevices, quantification methods
Référence
Microsc. Microanal.. 2020 Jan 10;:1-10