Sensitization of the PADC detector through a wide wavelength UV exposure, in a study utilizing irradiation with relativistic 300 MeV/n Ni ions.

Fiche publication

Date publication

novembre 2025

Journal

Applied radiation and isotopes : including data, instrumentation and methods for use in agriculture, industry and medicine

Auteurs

Membres identifiés du Cancéropôle Est :
Pr FROMM Michel

Tous les auteurs :
Awad ES, Fayad A, Bebers E, Fromm M, El-Faramawy N

Lien Pubmed

https://www.ncbi.nlm.nih.gov/pubmed/41308382

Résumé

The objective of this work was to study the changes in track parameters, including diameter, bulk etch rate, and PADC detector sensitivity, due to UVA, UVB, and UVC light exposure. High-energy ions were utilized to conduct a simultaneous comparison of different track parameters. A PADC detector previously irradiated with 300 MeV/n Ni ions and fission fragments (ff from 252Cf) was employed. Fission fragments facilitated the determination of the bulk etch rate. High-energy ions generate identical track dimensions on both sides of the detector after etching. Ni and fission fragment irradiated samples were exposed to UV light in air from one side, while the other side remained unexposed. The compared track parameters included bulk etch rate, track diameter, and detector sensitivity. Eighteen samples (9 for Ni and 9 for ff) were exposed for 1, 2, and 3 h to UVA, UVB, and UVC. Chemical etching of PADC under standard conditions (50 °C, 6.25 M NaOH) for 6 h initially produced tracks on both sides of the detector. After etching, the samples were re-exposed to UVA, UVB, and UVC, and subsequently etched for 3 h. This process was repeated 12 times. The track parameters were measured on both the exposed and unexposed sides. It was observed that the bulk etch rate and track diameter on the UV-exposed side increased; however, PADC sensitivity on the UV side declined. All these parameters were compared to those on the unexposed side. The relative differences between the track parameters on the UV-exposed side and the corresponding ones on the unexposed side were estimated and analyzed. UVA showed little effect on the track parameters, UVB demonstrated a medium effect, while a significant effect was noted with UVC. Recommendations are provided for the optimal use of UV pre-exposure to sensitize detectors and enhance the readability of chemically etched tracks.